PRODUCT
Cerium Oxide
CeO2
Description : 5nm, 20nm, 40nm materials applicable for CMP process
Features : Large specific surface area due to uniform particle distribution, excellent crystallinity.
Application : Abraisive for CMP proccess.
#Semiconductor #Ceria #CMP #Excellentflatness
#High-speed abrasive #High-quality
Purchase link
| CEO: Kim Woo-sik
| Hanshin Smeka 431, 65, Techno 3-ro, Yuseong-gu,
Daejeon, Republic of Korea
| Phone number: +82-42-822-9271
| Fax number: +82-42-825-9271
| E-mail: mpsp@nano-ot.com
Copyright (C) Korea Nano Ot Co., Ltd. All rights reserved.
CEO: Kim Woo-sik | Hanshin Smeka 431, 65, Techno 3-ro, Yuseong-gu, Daejeon, Republic of Korea
Phone number: +82-42-822-9271 | Fax number: +82-42-825-9271 | E-mail: mpsp@nano-ot.com
Copyright (C) Korea Nano Ot Co., Ltd. All rights reserved.
